Method for Increasing Adhesion of Copper to Polymeric Surfaces

ABSTRACT

Disclosed herein are methods and systems for conditioning a polymeric layer on a substrate to enable adhesion of a metal layer to the polymeric layer. Techniques may include conditioning the polymeric layer with nitrogen-containing plasma to generate a nitride layer on the surface of the polymeric layer. In another embodiment, the conditioning may include depositing a CuN layer using a lower power copper sputtering process in a nitrogen rich environment. Following the condition process, a higher power copper deposition or sputtering process may be used to deposit copper onto the polymeric layer with good adhesion properties.

CROSS REFERENCE TO RELATED APPLICATION

Pursuant to 37 C.F.R. §1.78(a)(4), this application claims the benefitof and priority to prior filed Provisional Application Ser. No.61/862,735 filed Aug. 6, 2013 and a continuation of co-pending U.S.Non-provisional application Ser. No. 14/308,420 filed on Jun. 18, 2014,which is expressly incorporated herein by reference.

BACKGROUND OF THE INVENTION

Techniques disclosed herein relate to semiconductor fabrication, andmore particularly to depositing metal onto a surface of a workpiece or asubstrate that may have an exposed polymeric surface.

In semiconductor manufacturing, metal films may be sputtered by physicalvapor deposition (PVD) process onto a variety of surfaces such assilicon, passivation coatings, other metals, and polymer coatings amongothers. In general, adhesion of most metals to polymer surfaces is poor.Developing special surface treatments or certain processing conditionsthat may be used to improve metal adhesion to polymer surfaces may bedesirable.

SUMMARY

Generally, a polymeric layer is not conducive to adhering of a metallayer. However, the polymeric layer may be treated or conditioned toimprove metal layer adhesion. The treatment or conditioning may includegenerating an adhesion layer that adheres to the polymeric layer and anoverlying metal layer and/or treating the surface of the polymeric layerto increase adhesion of the overlying metal layer. One particularapplication may include the deposition of a metal layer, such as copper(Cu), onto the surface of molded integrated circuit (IC) packages toprovide electro-magnetic interference (EMI) shielding. Cu depositedusing conventional physical vapor deposition (PVD) techniques mayexhibit poor adhesion to the underlying layer (e.g., IC package surface)and a pre-treatment process may be used to improve adhesion.

Exposure of the polymeric layer to a gaseous environment containingnitrogen may improve adhesion of various metals. In one embodiment, atwo-step metal deposition process may be used to deposit a metal layeron the polymeric layer. In the first step, a nitrogen and argon gasmixture may be used during a lower power deposition step to promoteadhesion between the polymeric layer and the metal layer.Nitrogen-containing species, including but not limited to, atomicnitrogen (N), diatomic nitrogen (N₂), atomic nitrogen ions (N⁺),diatomic nitrogen ions (N₂ ⁺), metastable nitrogen (N*, N₂*), etc., mayimpact, interact and/or embed in the polymeric layer to change thesurface conditions or energy in a way that improves metal adhesion. Inanother embodiment, a thin layer of metal may also be deposited at a lowdeposition rate in the presence of nitrogen-argon plasma to produce amodified interface for the metal film to be deposited on. In the secondstep, a metal layer may be deposited on top of the conditioned polymericlayer using a higher power deposition step. In this instance, the gasmixture may include argon and substantially less nitrogen, if at all,than the first step. As a result, the metal concentration of this metallayer may higher than any metal that may have been deposited in thepresence of the nitrogen-argon plasma.

In one embodiment, a physical vapor deposition (PVD) chamber may be usedto generate the adhesion layer on the polymeric layer followed by theoverlying metal layer. However, in another embodiment, a plasma etchchamber may be used to generate the adhesion layer and the PVD chambermay be used to generate the overlying metal layer. The PVD chamber andthe plasma etch chamber may be co-located on the same tool or they mayeach be used on separate tools.

During the first step, the PVD chamber may use a nitrogen gas mixturecoupled with a low magnetron or radio frequency (RF) power to ionize thenitrogen. The neutral and ionized nitrogen constituents may contact orbecome embedded in the polymeric layer and improve metal adhesion of thepolymeric layer. In one embodiment, the nitrogen gas mixture may includeup to 50% argon. The power applied to the magnetron or the electrode maybe less than or equal to 2 W/cm². In one specific embodiment, theapplied power may be approximately 0.1 W/cm². In another embodiment, thePVD chamber may also deposit a small amount of copper during thenitrogen gas mixture ionization. The process pressure may range between1-20 mTorr and more particularly between 2-15 mTorr. This may result ina deposited layer of 10-500 A of copper nitride on the polymeric layer.

In a plasma etch chamber embodiment, a low energy plasma source mayionize or dissociate the molecular nitrogen gas In one embodiment, thepolymeric substrate can be transferred in-situ to the PVD chamber formetal deposition. In this instance, the polymeric substrate istransferred to the PVD chamber without exposure to the ambientatmosphere.

During the second step, the PVD chamber may continue to deposit copperonto the adhesion layer using an argon dominant gas mixture and a powersetting that is greater than 2 W/cm² up to 20 W/cm². In one specificembodiment, the second step copper layer may exceed about 1 μm.

BRIEF DESCRIPTION OF THE DRAWINGS

The advantages of the technology described above, together with furtheradvantages, may be better understood by referring to the followingdescription taken in conjunction with the accompanying drawings. In thedrawings, like reference characters generally refer to the same partsthroughout the different views. The drawings are not necessarily toscale, emphasis instead generally being placed upon illustrating theprinciples of the technology.

FIG. 1 illustrates a schematic of a PVD chamber that may be used togenerate an adhesion layer and a metal layer on a polymeric substrate.

FIG. 2 illustrates a schematic of a plasma etch chamber that may be usedto condition a polymeric substrate for adhering a metal layer.

FIG. 3 illustrates a a flow diagram for a method for depositing a metallayer on a polymeric substrate and includes representative crosssections of the polymeric substrate during the implementation of themethod.

FIG. 4 illustrates another flow diagram for a method for depositing ametal layer on a polymeric layer and includes representative crosssections of the polymeric substrate during the implementation of themethod.

FIG. 5 illustrates a flow diagram for a method for treating a polymericlayer prior to depositing a metal layer on the polymeric layer andincludes representative cross sections of the polymeric substrate duringthe implementation of the method.

DETAILED DESCRIPTION

Although the present invention will be described with reference to theembodiments shown in the drawings, it should be understood that thepresent invention can be embodied in many alternate forms ofembodiments. In addition, any suitable size, shape or type of elementsor materials could be used. For example, while polymeric-metalstructures are described, the method and apparatus described herein maybe applicable to other microscale features.

FIG. 1 illustrates a schematic of processing tool 100 that may include aPVD chamber 102 that may be used to generate an adhesion layer (notshown) and a metal layer (not shown) on a polymeric substrate 104coupled to a substrate chuck 106. The PVD chamber 102 may be coupled topower source 108, a gas delivery system 110, and a vacuum system 112.

The power source 108 may be connected to a metal source or target 114that may provide the metal that may be deposited or sputtered on to thepolymeric substrate 106. In one embodiment, the metal source 114 mayinclude copper in one or more variations and concentrations. The powersource 108 may apply power (e.g., 1 W/cm² up to 20 W/cm²) to the metalsource 114 to enable the deposition or sputtering of copper ions towardsthe polymeric substrate 106 as indicated by the Cu arrows in FIG. 1. Inconjunction with the power source 108, the vacuum system 112 maymaintain a process pressure of 2-15 mT during the sputtering process andthe gas delivery system 110 may also provide an argon gas 116 tomaintain an argon environment during the sputtering process. In additionto the sputtering process, the PVD chamber 102 may also be used tocondition and/or to deposit an adhesion layer on the polymeric substrate104.

Generally, the conditioning or the adhesion layer may be done using anitrogen gas mixture and a lower power applied to the metal source 114in comparison with the sputtering process described immediately above.In one embodiment, the nitrogen gas 118 may be mixed with the argon gas116 up to 50%. The power source 108 may apply no more than 1 W/cm² ofpower to the metal source 114 during the conditioning process. Theprocess pressure may vary between 1 mTorr and 20 mTorr. Theconcentration of nitrogen and/or copper in the adhesion layer may varywith different gas flows, power, and pressure. In one embodiment, theconcentration of nitrogen and argon gas is controlled by the gas flowrates into the chamber (e.g., Ar 116, N₂ 118). The gas flow rates may becontrolled via a mass flow controller. However, the concentration of gasmay also be controlled by other means that may include, but is notlimited to, sampling PVD chamber 102 to determine the amount of N₂ andAr that is present.

In another embodiment, the polymeric substrate 104 conditioning may beachieved by using a plasma etch chamber 200, as shown FIG. 2, that maybe coupled to the processing tool 100. The polymeric substrate 104 maybe placed on or coupled to the plasma substrate chuck 202. The plasmaetch chamber 200 may be coupled to a radio frequency (RF) power source204, a gas delivery system 206, and a vacuum system 208.

In one embodiment, the conditioning process may include a nitrogen 212and argon 214 gas mixture that enables a nitrogen rich processingenvironment. The vacuum system 208 may control the process pressure to aset point between 0.5 and 10 mTorr. The RF power source 204 may applypower to an electrode 210 that may be disposed above the polymericsubstrate 104.

The RF power source 206 may provide power to the electrode 210 tosufficiently ionize the nitrogen-argon gas mixture to generate a plasmathat may include, but is not limited to, atomic nitrogen (N), diatomicnitrogen (N₂), atomic nitrogen ions (N⁺), diatomic nitrogen ions (N₂ ⁺),metastable nitrogen (N*, N₂*), etc. Following the conditioning process,the polymeric substrate 104 may be moved in-situ to the PVD chamber 102to deposit the metal layer as described above in the description of FIG.1.

The plasma chamber 200 may be implemented in several different ways thatmay include, but is not limited to, capacitive coupling, inductivecoupling, microwave sources, electron cyclotron resonance, and/or radialline slot antenna sources. Accordingly, the plasma chamber 200 mayconfigured to use the techniques that are known in the art. For example,the electrode 210 may include, but is not limited to, parallel plateelectrodes for capacitive coupling, loop or helical antenna or coil forinductive coupling, and so on.

In another embodiment, the plasma etch chamber 200 or a gas cluster ionbeam tool (not shown) may generate a nitrogen plasma that may include,but is not limited to, atomic nitrogen (N), diatomic nitrogen (N₂),atomic nitrogen ions (N⁺), diatomic nitrogen ions (N₂ ⁺), metastablenitrogen (N*, N₂*), etc. that may direct the ions at the polymericsubstrate 104. This nitrogen plasma may be generated by a modifiedplasma chamber (not shown) that may be able to control the sheathboundary layer potential close to the substrate. In this way, thenitrogen ions within the modified plasma chamber may be directed towardsthe polymeric layer when the sheath potential is adjusted. In anotherembodiment, the ion beam may be generated by a gas cluster ion beam tool(not shown) that may be designed to modify the polymeric layer at thenano-scale level.

FIG. 3 illustrates a method flow diagram 300 for depositing a metallayer 318 on a substrate 310 that may include a polymeric layer 312. Tothe right of the method flow diagram 300 are representativeillustrations one or more steps that may be implemented by the method.Broadly, the method may be used to increase metal adhesion of thepolymeric layer 312. The method may include a first step that maycondition the polymeric layer to increase metal adhesion and a secondstep that may deposit metal (e.g., copper) onto the conditionedpolymeric layer 312. The method flow diagram 300 is one example of howthe method may be implemented. In other embodiments, the steps of themethod may be performed in a different order and/or one or more of thesteps may be omitted. In one specific embodiment, the conditioning andmetal deposition may occur concurrently in a manner that adjusts theconcentration of nitrogen and copper in the PVD chamber 102 over time.

Turning to the method 300, at block 302, the substrate chuck 106 mayreceive the substrate 310 that may be an exposed polymeric layer 312 orsurface. In one embodiment, the substrate may include, but is notlimited to, a silicon substrate, a gallium-arsenide substrate, or anyother semiconductor substrate. In one specific embodiment, the substratemay include an electronic device (not shown) that may use the polymericlayer 312 as a protective layer against electro-magnetic interference(EMI). The electronic device may be packaged in a molding thatelectrically isolates the electronic device from the environment, orvice versa, except along paths (e.g., leads or solder points) that maybe intended to carry current to or from the electronic device. Theelectrical isolation may include, but is not limited to, electromagneticsignals generated by other devices or components that are not intendedto be integrated into the operation of the electronic device. Shieldingof the electronic device may be accomplished by at least partiallyencapsulated the packaged electronic device with a metal layer that maybe coupled to electrical ground. The shielding may also shield noisegenerated by the shielded device from other devices or components.

In one embodiment, a plurality of packaged electronic devices may becarried by and/or processed in a tray (e.g., JEDEC (Joint ElectronDevice Engineering Council) standard tray). The batch processing ofseveral packaged electronic devices at the same time may reduce cycletime and production cost.

The polymeric layer 312 may include, but is not limited to, an epoxyresin that may be polymeric or semi-polymeric. The epoxy may include aresin component and a hardener component that when mixed together maybond to form a solid material. In one specific embodiment, the polymericlayer may include a silicone impregnated epoxy. In general, thepolymeric layer 312 may have poor intrinsic metal adhesion propertiesthat may cause applied metal layers to peel or separate from thepolymeric layer 312. Accordingly, the polymeric 312 may use aconditioning process to increase its metal adhesion capability.

At block 304, the PVD chamber 102 or the plasma etch chamber 200 mayactivate the exposed polymeric layer 312 by treating the exposedpolymeric layer 312 with argon-nitrogen plasma 314. The activation mayinclude, but is not limited to, altering the surface energy or surfacestates of the polymeric layer in a way that will make adhesion of metalor copper to the polymeric layer 312 more likely. In one instance, thesurface of the polymeric layer 312 may include altered or additionalbonds that may adhere more strongly with copper than an unconditionedpolymeric layer 312.

The conditioning may occur due to the nitrogen ions or atoms bombardingthe polymeric layer 312 in an isotropic and/or anisotropic manner. Thenitrogen ions may alter or activate the surface. In any event, thebombarded or embedded surface may create at least a portion of anadhesion layer 316 that may facilitate the adhesion of a metal layer.The overlying copper layer may be at least 0.2 um. In one specificembodiment, the adhesion layer may 316 range between 300 A and 800 Athat may accommodate an overlying copper layer with a target thicknessbetween 0.2 μm to 12 μm.

At block 306, the PVD chamber 102 may deposit a first copper-containinglayer as an adhesion layer 316 of copper on the exposed polymeric layer312 after having been activated using nitrogen-containing plasma 314.For example, the method may include introducing a first process gascontaining a noble gas and nitrogen-containing gas and sputtering copperfrom a copper target (e.g., metal source 114) operated at a first powercondition equal to or less than 2 W per cm2. The nitrogen-containing gasmay include a nitrogen-argon mixture wherein the concentration ofnitrogen ranges between 1% to 50%. In one specific embodiment, thenitrogen mixture may be about 5% to adhere a copper layer of up to 3 μm.In other embodiments, the nitrogen concentration may be a higherpercentage for thicker metal stacks. The nitrogen concentration may alsobe optimized for other materials that may be deposited on top of thosemetals stacks. In one embodiment, the concentration of nitrogen andargon gas is controlled by the gas flow rates into the chamber (e.g., Ar116, N₂ 118) as shown at least FIG. 1. However, the concentration of gasmay also be controlled by other means that may include, but is notlimited to, sampling PVD chamber 102 to determine the amount of N₂ andAr that is present.

In one embodiment, the activating of the exposed polymeric layer 312occurs in a first processing chamber (e.g., plasma etch chamber 200) andthe deposition of the first copper-containing layer occurs in a secondprocessing chamber (e.g., PVD chamber 102). In this instance, thesubstrate 102 may be moved from the plasma etch chamber 200 to the PVDchamber 102 without exposure to ambient atmospheric conditions to enablethe deposition of the second copper containing layer (e.g., metal layer318). However, in another embodiment, the PVD chamber 102 may activatethe polymeric layer 312 and deposit the first copper-containing layer316.

At block 308, the PVD chamber 102 may deposit a second copper-containinglayer (e.g., metal layer 318) on the first copper-containing layer(e.g., adhesion layer 316) via a physical vapor deposition process. Thesecond copper-containing layer may include a higher concentration ofcopper than the first copper-containing layer. The secondcopper-containing layer may also be thicker than the firstcopper-containing layer. Likewise, the first copper containing layer mayhave a higher nitrogen concentration than the second copper-containinglayer.

In one specific embodiment, the first copper-containing layer and thesecond copper-containing layer occurs as a single continuous depositionprocess. For example, both layers may be deposited in the same PVDchamber 102 by adjusting the process conditions (e.g., gas flow, power,etc.) to change the copper concentration of the film being deposited onthe substrate 310. In one instance, the process changes may includelowering the nitrogen concentration and increasing the power applied tothe target 114. This may result in the nitrogen concentrationtransitioning from a relatively higher concentration to a lower or zeroconcentration with increasing thickness. The nitrogen concentration inthe metal stack may decrease as the distance from the polymeric layer312 increases. In this way, the activating or exposing of the polymericlayer 312 and the depositing of the copper may be performed concurrentlyor simultaneously.

The adhesion of the polymeric layer 312 and the first and/or secondcopper containing layers 316, 318 may also be adjusted by controlling ormodifying the stress in the copper layers. In PVD sputtering systems,this can be modulated by varying the gas pressure during the processwhere in general the trend is transitioning from tensile to compressivefilm stress as gas pressure is lowered and ion bombardment increases.This effect can also be achieved in cases where unbalanced magnetronsare used or where applied substrate biases are possible. Extrinsicfactors affecting stress (and possibly adhesion at metal-polymerinterfaces) such as in-service temperature range of the device,properties of the polymer (thermoset versus thermoplastic) andin-service mechanical stresses (tension, compression, torsion, etc.)should be considered in tailoring the proper intrinsic film stress forthe application.

FIG. 4 illustrates another method 400 for depositing a metal layer(e.g., copper layer 416) on a polymeric substrate 408 and includesrepresentative cross sections of the polymeric substrate 408 during theimplementation of the method 400. In other embodiments, the steps of themethod may be performed in a different order and/or one or more of thesteps may be omitted. In one specific embodiment, the conditioning andmetal deposition may occur concurrently in a manner that adjusts theconcentration of nitrogen and copper in the PVD chamber 102 over time.

At block 402, the PVD chamber 102 may receive a substrate 408 with anexposed polymeric surface. The PVD chamber 102 may generate a vacuum andexpose the substrate to sub-atmospheric conditions. For example, thepressure may range between 1 mTorr to about 20 mTorr. In one specificembodiment, the pressure may include a set point between 2 mTorr toabout 15 mTorr.

At block 404, the PVD chamber 102 may deposit a first copper-containinglayer 412 directly on the exposed polymeric surface 408 in a firstnitrogen-containing environment that may include nitrogen plasma 414.The deposition process may include, but is not limited to, introducing afirst process gas mixture containing a noble gas and nitrogen-containinggas. In one specific embodiment, the noble gas may be argon and may makeup to at least 50% of the gas mixture. The PVD chamber 102 may alsosputter copper from a copper target 114 operated at a first powercondition that includes a sputtering power per unit area of substrateequal to or less than 2 W per cm2. The target thickness of the firstcopper-containing layer ranges from about 10 Angstroms to about 500Angstroms. The first copper-containing layer 412 is CuNx, wherein x is anon-zero real number.

At block 406, the PVD chamber 102 may deposit a second copper-containinglayer 416 on the first copper-containing layer 412. The depositionprocess may include, but is not limited to, introducing a second processgas containing a noble gas. In one specific embodiment, the noble gasmay include argon. The PVD chamber 102 may also sputter copper from thecopper target 114 operated at a second power condition that includes asputtering power per unit area of substrate greater than 2 W per cm2.The thickness of the second copper-containing layer may exceed about 1micron. In one specific embodiment, the second copper-containing layer416 is substantially copper.

FIG. 5 illustrates a flow diagram 500 for a method for treating asubstrate with a polymeric layer prior to depositing a metal layer onthe polymeric layer. The substrate may include a packaged electronicdevice 508 that may be encapsulated or covered by the polymeric layer510. The packaged electronic device 508 may have electrical leads (notshown) or ball solder joints (not shown) that may enable the packagedelectronic device 508 to be electrically coupled with a printed circuitboard or another electronic device. The copper layer 512 that isdeposited over the packaged electronic device 508 may provide EMIshielding and may be coupled to electrical ground (not shown).Electromagnetic energy that may cause electrical interference whenintercepted by the packaged electronic device may be directed to groundby the copper layer 512.

At block 502, the packaged electronic device 508 comprising a polymericlayer 510 or material may be provided to the etch chamber 200. In oneembodiment, the polymeric material 510 comprises an epoxy resin or asilicone impregnated epoxy that substantially covers the packagedelectronic device 508. The polymeric layer 510 may be used as anadhesion layer for subsequent layers deposited on the packagedelectronic device 508. In certain instances, the adhesion layer may beconditioned or pre-treated to increase the adhesion between thepolymeric layer 510 and the subsequent deposited layer.

At block 504, the polymeric layer 510 may be exposed to a plasmacomprising nitrogen-containing species generated by the etch chamber200. The nitrogen-containing species, may include but not limited to,atomic nitrogen (N), diatomic nitrogen (N₂), atomic nitrogen ions (N⁺),diatomic nitrogen ions (N₂ ⁺), metastable nitrogen (N*, N₂*), etc. Theplasma may be generated by introducing nitrogen (N2) gas into the etchchamber 200 at sub-atmospheric pressure and energizing the gas usingpower provided by the RF power source 204. The nitrogen ions or atomsmay be directed towards the polymeric layer 510 and may roughen thesurface and/or alter the chemical composition of the exposed polymericlayer 510. The resulting surface roughness and/or chemical compositionmay increase the adhesion affinity with the subsequent layer (e.g.,copper layer 512).

In one embodiment, the plasma may be generated using sub-atmosphericprocess conditions between 0.5 and 10 mTorr. Nitrogen or a combinationof nitrogen and another noble gas (e.g., >25% Ar) may be introduced intothe etch chamber 200 at pressure. The etch chamber 200 may include an RFelectrode that may distribute power across the etch chamber 200. Thepower may interact with the gas to form monatomic nitrogen ions (N⁺) bysplitting the N₂ molecules and displacing electrons from the monatomicnitrogen. The plasma may bombard the polymeric layer 510 in an isotropicor anisotropic manner.

At block 506, a copper layer 512 may be deposited on the exposedpolymeric layer 510 using sputtering techniques. In one embodiment, thecopper layer 512 may be deposited using a physical vapor deposition(PVD) process using the sputter chamber 102 as described in thedescription of FIG. 1.

In one embodiment, the sputtering process may include providing a gasmixture of a noble gas (e.g., Ar) and nitrogen into the sputter chamber102. A magnetron (e.g., power source 108) may provide power to thesputter chamber 102 to sputter metal from metal target 114 inside thesputter chamber 102 onto the polymeric layer 510. In one specificembodiment, the power provided by the magnetron may be greater than 1W/cm². The copper layer 512 may range in thickness between 1 and 15 um.

It should be understood that the foregoing description is onlyillustrative of the invention. Various alternatives and modificationscan be devised by those skilled in the art without departing from theinvention. Accordingly, the present invention is intended to embrace allsuch alternatives, modifications and variances that fall within thescope of the appended claims.

1. A system comprising: a surface energy chamber comprising: a firsttray chuck; an electrode adjacent to the first tray chuck, the electrodecomprising one or more of the following: parallel plate electrode, aloop antenna, a helical antenna, or a magnetic coil; and a power sourcein electrical communication with the electrode, the power comprising aradio frequency (RF) source or a microwave source; a metal depositionchamber comprising: a second tray chuck; and a metal sputtering targetadjacent to the sputter tray chuck; an encapsulated device tray handlingsystem to move a tray of encapsulated electronic devices between thesurface energy chamber and the metal deposition chamber.
 2. The systemof claim 1, wherein the surface energy chamber uses the electrode andthe power source to alter a surface energy or a surface state of theencapsulated electronic devices.
 3. The system of claim 1, wherein thesystem comprises a gas delivery system for a nitrogen gas or a noblegas.
 4. The system of claim 3, wherein the surface energy chamber cangenerate a nitrogen-containing plasma.
 5. The system of claim 1, whereinthe surface energy chamber comprises a plasma etch chamber.
 6. Thesystem of claim 1, wherein the encapsulated devices comprise: aprotective cover that isolates the device from ambient conditions; andelectrical leads that can carry electrical current to or from theencapsulated device.
 7. The system of claim 1, wherein the metal targetelectrode comprises copper.
 8. The system of claim 1, wherein theencapsulated devices comprise a printed circuit board or at least twoencapsulated devices that are coupled together to form the encapsulateddevice.
 9. The system of claim 1, wherein the encapsulated devices areelectrically isolated from each other.
 10. The system of claim 1,wherein the tray comprises a JEDEC standard tray.
 11. The system ofclaim 1, wherein the encapsulated devices comprise a polymeric layer.12. The system of claim 1, wherein the encapsulated devices comprise asilicone impregnated epoxy.
 13. A system, comprising a surface treatmentcomponent that can improve adhesion of a metal layer to an electronicdevice by using a nitrogen-containing plasma; a metal treatmentcomponent that can apply the metal layer to the electronic devicecomprising an electrical communication component; and a tray movementsystem that can move a tray including the electronic device between thesurface treatment component and the metal treatment component.
 14. Thesystem of claim 13, wherein the electrical communication componentcomprises an electrical lead, a solder joint, or a ball contact
 15. Thesystem of claim 14, wherein the electrical lead, the solder joint, orthe ball contact is configured to be coupled to a printed circuit boardor another electronic device.
 16. The system of claim 13, wherein thetray comprises a plurality of electronic devices.
 17. The system ofclaim 13, wherein the electronic device comprises a polymeric layer thatis treated in the surface treatment component.
 18. The system of claim13, wherein the electronic device comprises as a protective layeragainst electro-magnetic interference (EMI).
 19. The system of claim 13,wherein the surface treatment comprises a plasma electrode and the metaltreatment component comprises a magnetron or a sputter target.
 20. Asystem, comprising: a first chamber comprising a means for altering asurface energy or a surface state of a plurality of encapsulated deviceswhen they are disposed in the first chamber; a second chamber comprisinga means for depositing a metal layer on the plurality of encapsulateddevices when they are disposed in the second chamber; a tray movementapparatus comprising a means for moving a tray between the first chamberand the second chamber, the tray comprising the plurality ofencapsulated devices.